Stabilization of the Ferroelectric Phase in Epitaxial Hf<sub>1–<i>x</i></sub>Zr<i><sub>x</sub></i>O<sub>2</sub> Enabling Coexistence of Ferroelectric and Enhanced Piezoelectric Properties
نویسندگان
چکیده
Systematic studies on polycrystalline Hf1–xZrxO2 films with varying Zr contents show that HfO2 are paraelectric (monoclinic). If the content is increased, become ferroelectric (orthorhombic) and then antiferroelectric (tetragonal). shows very good insulating properties it used in metal-oxide-semiconductor field-effect devices, while ZrO2 piezoelectric properties, but antiferroelectric. In between, Hf0.5Zr0.5O2 at expense of poorer than ZrO2, respectively. Here, we explore ferroelectric, insulating, a series epitaxial different compositions. We growth permits stabilization phase whole range (from x = 0 to 1). films, ferroelectricity coexists better Hf0.5Zr0.5O2, Hf0.5Zr0.5O2. For case large electroresistance also observed. both cases, endurance for
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ژورنال
عنوان ژورنال: ACS applied electronic materials
سال: 2021
ISSN: ['2637-6113']
DOI: https://doi.org/10.1021/acsaelm.1c00122